These structures would be characterized by a variety of metrologies and would provide well-characterized profiles. 4 has certain distinct advantages over the prior art arrangements of FIGS. It can be used on mirrors, various reflectors and precision machined surfaces. Third, the arrangement of array 90 of FIG. It is providing a fast, non-destructive way to monitor surface roughness and optical characteristics, so it allows you to quickly monitor surface degradation. For example, the method is primarily used to assess two-dimensional profiles. 1. MicroScan Scatterometer. The same information can be plotted in a different manner which might be more suitable for specific applications (for example, scattered light in parts per million plotted versus scatter angle). Fifth, the light source in the system of FIG. Samples of r.m.s. The measurement technique is efficient in that measurements of scattered light at all the different values of θs (i.e. 5. ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:MCNEIL, JOHN R.;REEL/FRAME:011742/0839, Owner name: PATENTED CASE, Owner name: Assigned to AOTI OPERATING COMPANY, INC. The time typically required to characterize the scattered light at one point on a sample ranges from minutes to more than an hour. It is important to note that the range of the spatial frequency over which the scatterometer can measure is limited by the geometry of the apparatus and the wavelength of laser radiation used. Questions thus arise about the accuracy of the method for realistic structures. ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:AOTI OPERATING COMPANY, INC.;REEL/FRAME:020794/0647, Owner name: This can take the form of a conventional integrating circuit using standard operational amplifiers 1 and 2 shown in the circuit diagram of FIG. Total integrated scatter varies as (1/x)n, where n is between 2 and 4. 4 is of sufficiently long focal length (approximately 50 cm) to allow use of multiple apertures 60 as illustrated. 2. Each diode of the array monitors the intensity of light scattered at a specific angle θs. This arc is the same arc as that of the detector 30 illustrated in FIG. Array 80 is employed for detection of the incident laser beam without the sample in place. microroughness typical of samples encountered in optics and microelectronics fabrication, typically 0.5 nm to 2.0 nm r.m.s. roughness less than 0.2 nm have been examined with the system illustrated in FIG. By comparing measurements with a library of calculated model results, the profile can be inferred. 4. 7. FIG. The diameter of the laser radiation spot on the sample is typically 2 to 5 mm. 25 044019 View the article online for updates and enhancements. An optical scatterometer system as in claim 5 wherein: said one or more optical detectors are positioned in a plane perpendicular to a plane containing said first and second incident laser beams to detect indications of back-scattered and forward-scattered light in said plane perpendicular to said plane containing said first and second incident laser beams. The sample 20 under investigation is illuminated with a laser 10, and the light scattered by the sample is measured using the PMT detector 30 as illustrated. If the sample transmits light at the wavelength of use in the scatterometer, the scattered light is indicative of both surface and volume microstructure of the sample. Given this arc dimension, a detector element size range of approximately 0.01 inches to as large as 0.50 inches is most practical. From a single measurement, a user can determine RMS surface roughness, Reflectance and scattered light level (BRDF) on flat or curved surfaces under any lighting conditions. This is directly related to the angular orientation of the optical sample. Array 90 is employed for detection of scattered light from the sample under test. Thus, the plot represents the power spectral density of the microstructure on a surface. This invention relates generally to optical scatterometers and more specifically to an improved optical scatterometer exhibiting improved sensitivity and bandwidth characteristics. said optical scatterometer system further comprises second laser means for transmitting a second incident laser beam having a second wavelength different from said first wavelength, said second wavelength being selected such that said second incident laser beam is transmitted by said material. These apertures block stray light that could originate from the lens 55. The wavelength x of the typical light source for the arrangement represented in FIG. For example, for over a decade the optical scatterometer has been used to examine surfaces of optical components, such as dielectric mirrors, metal mirrors, and glass substrates. An optical scatterometer system as in claim 5 wherein said one or more optical detectors are positioned in a plane containing said first and second incident beams and are further positioned in a circular arc whose center coincides with said spot on said material. 4, there is shown an optical scatterometer apparatus constructed in accordance with the present invention. 3, also provides for measurements over a wider range of microroughness spatial frequency or lateral dimension. Standards are needed in order to validate the method. This directly influences the range of spatial frequency which can be characterized by the equation set forth above. The main disadvantages include the lack of discrimination for oil and the lack of imaging capability. Detector element shape may be circular, square or rectangular. Standards are needed in order to validate the method. for θs less than 90 degrees). where d is the spatial wavelength (lateral dimension) of the microstructure, θi is the angle of incidence of the laser 10, and x is the wavelength of the laser light used in microns (μ). the structure actually scattering light) are related by the equation. The silicon photodiode 35 in this case is connected in a photovoltaic detection arrangement as shown in FIG. Apparatus for collecting light and its method of manufacture, Measurement arrangement for power or energy of optical radiation of radiation source has detectors connected together in state generated measurement signals are processed to form one resultant sum signal, Parametric Profiling Using Optical Spectroscopic Systems, Overlay targets with isolated, critical-dimension features and apparatus to measure overlay, Spherical scattering-light device for simultaneous phase and intensity measurements, Interferometer for determining characteristics of an object surface, Interferometer for determining characteristics of an object surface, including processing and calibration, Apparatuses and methods for enhanced critical dimension scatterometry, Scatterometer having a computer system that reads data from selected pixels of the sensor array, Two-dimensional optical imaging methods and systems for particle detection, Multiple input, multiple output (MIMO) communication via multimode media, Interferometric systems and methods featuring spectral analysis of unevenly sampled data, Low coherence interferometry with scan error correction, Fiber-based interferometer system for monitoring an imaging interferometer, Scan error correction in low coherence scanning interferometry, Method for determining the static and / or dynamic light scattering, Scattering formula nephelometer with axially illumination and circular photodetector, Particle detection method including comparison between sequential scans, Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination, Optical micrometer for measuring thickness of transparent substrates based on optical absorption, Chemical characterization of surface features, Foreign matter inspection method and apparatus, Process of reconstructing a single data profile of rapidly measured hemispherical scattered or radiated light, Inspection of transparent substrates for defects, Device for detecting foreign matter and method for detecting foreign matter, Sample cell for light scattering measurements, Acousto-optic tunable filter-based surface scanning system and process, Visible and infrared polarization ratio spectroreflectometer, Total reflection x-ray fluorescence apparatus, Microroughness-blind optical scattering instrument, Apparatus and method for the analysis of particle characteristics using monotonically scattered light.
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